MtPh

Semiconductor Manufacturing: History and Challenges

date
14.11.2018 
time
10:00 AM - 11:00 AM 
speaker
Dr. Pavel Nesladek 
affiliation
Advanced Mask Technology Center GmbH & Co. KG 
language
en 
main topic
Materials: Superconductors, Magnetic Materials, Nano Structures
subtopics
Physics: Condensed Matter (incl. Soft, Solid)
host
Brit Präßler-Wüstling 
abstract

The history of semiconductor manufacturing is strongly linked and limited by the development of optical lithography. The talk briefly summarizes the history of the integrated circuit development with the focus on the milestones of optical lithography and mask manufacturing. An overview of the currently used mask types and their functions is presented.
The unit processes starting from the data preparation, pattern generation and resist development up to metrology and inspection of the final products are stones of the mosaic building the integrated process for successful manufacturing of any mask as well as a chip on wafer.
Process development for new technology nodes is the key for cutting edge of the technology leadership and it provides our customers with the access to the world class processes and products, including extreme ultraviolet masks. Especially, the EUV technology is facing problems, observed never before, due to very sophisticated mask stacking. The second part of the talk will show the observed and investigated scientific/technological problems, which have been published, at AMTC Dresden.

 

Last update: 14.11.2018 00:08.

venue 

Leibniz Institut für Festkörper- und Werkstoffforschung Dresden (B3E.26, IFW Dresden, Helmholzstraße 20) 
Helmholtzstraße 20
01069 Dresden
homepage
http://www.ifw-dresden.de 

organizer 

Leibniz Institut für Festkörper- und Werkstoffforschung Dresden (IFW)
Helmholtzstraße 20
01069 Dresden
homepage
http://www.ifw-dresden.de 
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