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UID:DSC-22796
DTSTART;TZID=Europe/Berlin:20260505T140000
SEQUENCE:1777959423
TRANSP:OPAQUE
DTEND;TZID=Europe/Berlin:20260505T150000
URL:https://www.dresden-science-calendar.de/calendar/de/detail/22796
LOCATION:IFW\, Helmholtzstraße 2001069 Dresden
SUMMARY:Fischer: Metasurfaces and Metasurface Devices in 200 mm Wafer Si Te
 chnology
CLASS:PUBLIC
DESCRIPTION:Speaker: Prof. Dr. Inga Fischer\nInstitute of Speaker: BTU Senf
 tenberg\nTopics:\n\n Location:\n  Name: IFW (D2E.27\, IFW Dresden)\n  Stre
 et: Helmholtzstraße 20\n  City: 01069 Dresden\n  Phone: \n  Fax: \nDescri
 ption: Nanostructures can be used to tailor light-matter interaction in ma
 ny ways. Optical metasurfaces composed of two-dimensional configurations o
 f sub-wavelength sized metallic or dielectric nanostructures in particular
  have a large range of potential applications\, e.g.\, as perfect absorber
 s or sensors. Their combination with optoelectronic devices can enable and
  enhance device functionality. Here\, we report on the transfer of prototy
 pe device realizations in a university cleanroom to a 200 mm Si BiCMOS pil
 ot line\, i.e. the combination of plasmonic nanohole arrays with Ge photod
 etectors for on-chip refractive index sensing as well as the realization o
 f metasurface-based\, wavelength-selective photodetectors on the Si platfo
 rm. The reproducibility of CMOS-compatible fabrication methods can also le
 veraged for the realization of metasurfaces with tailored properties for l
 ight-matter interaction. We present examples based on plasmonic metasurfac
 es\, whose optical properties are strongly influenced by near-field intera
 ctions between the individual meta-atoms. Our results not only highlight c
 hallenges and opportunities in implementing metasurfaces as functional dev
 ice layers\, they also showcase the advantages of using high precision Si 
 technology for the fabrication of nanophotonic structures.
DTSTAMP:20260610T160908Z
CREATED:20260326T064006Z
LAST-MODIFIED:20260505T053703Z
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