Area-selective Atomic Layer Deposition & Laser Induced MaterialsProcessing in Advanced Micro- & Nanopatterning

Datum

11.12.2018

Zeit

15:00 - 16:00

Sprecher

Dr. Pedro Deminsky

Zugehörigkeit

Linkoping University, Linkoping, Sweden

Sprache

en

Hauptthema

Materialien

Andere Themen

Materialien, Physik

Host

Ines Firlle

Beschreibung

Micro and nanoscale film patterning and nanostructures growth are an essential parts of modern microelectronics industry. As device scaling proceeds toward sub-10 nm era where process tolerances become atomic-scale, the adoption of alternative nanoscale process integration schemes become critical for novel device concepts. Area-selective atomic layer deposition (AS-ALD) has attracted immense attention in recent years for self-aligned accurate pattern placement with subnanometer thickness control. From another prospective, laser induced periodic surface structuring is another low-cost and high-speed method for the creation of periodic nanostructures with femtosecond pulses. In this talk, after a brief overview of area-selective atomic layer deposition, I will present a methodology to achieve AS-ALD by using inductively couple plasma grown fluorocarbon polymer, PMMA and PVP films (as hydrophobic blocking layer materials), and graphene (as a lift-off material). Our approach has been tested for noble metals (Pt, Pd), metal-oxides (TiO2, ZnO, Al2O3, HfO2), and III-Nitride materials (AlN, InN) using thermal and plasma-enhanced ALD processes. Then I will continue with laser-induced periodic materials processing in femtosecond mode regime and will describe its impact on surface micro- & nanopatterning. I will then move to area-selective laser-material processing and will present our accomplishment of developing superhydrophobic/superhydrophilic interfaces for wettability applications. Finally, I will discuss necessity of extending the already existing methods for selective materials deposition/processing and will describe the future directions of the development of efficient and convenient AS-ALD processes.

Links

• Seminars at the IFW

Letztmalig verändert: 11.12.2018, 01:06:59